Papers › Probing growth precursor diffusion lengths by inter-surface diffusion
Probing growth precursor diffusion lengths by inter-surface diffusion
Stoffel D. Janssens, Francisco S. Forte Neto, David Vázquez-Cortés, Fernando P. Duda, Eliot Fried
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Understanding and optimizing thin-film synthesis requires measuring the diffusion length d_α of adsorbed growth precursors. Despite technological advances, in-situ measurements of d_α are often unachievable due to harsh deposition conditions, such as high temperatures or reactive environments. In this paper, we propose a fitting approach to determine d_α from experimental data by leveraging inter-surface diffusion between a substrate and a strip obtained by, for example, processing a film. The substrate serves as a source or sink of precursors, influencing the growth dynamics and shaping the profile of the strip. By fitting simulated profiles to given profiles, we demonstrate that d_α can be determined. To achieve this, we develop a theoretical growth model, a simulation strategy, and a fitting procedure. The growth model incorporates inter-surface diffusion, adsorption, and desorption of growth precursors, with growth being proportional to the concentration of adsorbed precursors. In our simulations, a chain of nodes represents a profile, and growth is captured by the displacement of those nodes, while keeping the node density approximately constant. For strips significantly wider than d_α, a scaled precursor concentration and d_α are the fitting parameters that are determined by minimizing a suitably defined measure of the distance between simulated and given profiles. We evaluate the robustness of our procedure by analyzing the effect of profile resolution and noise on the fitted parameters. Our approach can offer valuable insights into thin-film growth processes, such as those occurring during plasma-enhanced chemical vapor deposition.
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