Papers › Inverse design of photonic devices with strict foundry fabrication constraints

Inverse design of photonic devices with strict foundry fabrication constraints

31 Jan 2022arXiv:2201.12965archive 2025-07-28

Martin F. Schubert, Alfred K. C. Cheung, Ian A. D. Williamson, Aleksandra Spyra, David H. Alexander

We introduce a new method for inverse design of nanophotonic devices which guarantees that resulting designs satisfy strict length scale constraints - including minimum width and spacing constraints required by commercial semiconductor foundries. The method adopts several concepts from machine learning to transform the problem of topology optimization with strict length scale constraints to an unconstrained stochastic gradient optimization problem. Specifically, we introduce a conditional generator for feasible designs and adopt a straight-through estimator for backpropagation of gradients to a latent design. We demonstrate the performance and reliability of our method by designing several common integrated photonic components.

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